GENERATION
OF EUV BY PLASMA FOCUS
DEVICE WITH
GAS-PUFF OPERATION
http://www.nifs.ac.jp/report/nifs-proc79.pdf
H.Yamada,
M. Sato and K. Shimoda
Department
of Electronic Engineering, Gunma University,
1-5-1
Tenjin-cho, Kiryu, 376-8515, Japan
ABSTRACT
We reduced
the number of the condensers to make lower the temperature of the
pinched
plasma and generation of the soft X-ray was suppressed. We performed the
experiments
with the grazing-incidence spectroscope to analyze the wavelengths of the
EUV light.
From the spectral lines, generation of the EUV light of 13.5 nm was verified.
We improved
our small plasma focus device to the gas-puff style to increase the EUV
output. In
the gas-puff style, the peak value at the first peak became about twice higher
than that
in the mixed gas style.
Keywords:
plasma focus, EUV, gas-puff operation