GENERATION OF EUV BY PLASMA FOCUS

DEVICE WITH GAS-PUFF OPERATION

http://www.nifs.ac.jp/report/nifs-proc79.pdf

H.Yamada, M. Sato and K. Shimoda

Department of Electronic Engineering, Gunma University,

1-5-1 Tenjin-cho, Kiryu, 376-8515, Japan

ABSTRACT

We reduced the number of the condensers to make lower the temperature of the

pinched plasma and generation of the soft X-ray was suppressed. We performed the

experiments with the grazing-incidence spectroscope to analyze the wavelengths of the

EUV light. From the spectral lines, generation of the EUV light of 13.5 nm was verified.

We improved our small plasma focus device to the gas-puff style to increase the EUV

output. In the gas-puff style, the peak value at the first peak became about twice higher

than that in the mixed gas style.

Keywords: plasma focus, EUV, gas-puff operation