OF EUV BY PLASMA FOCUS
M. Sato and K. Shimoda
of Electronic Engineering, Gunma University,
Tenjin-cho, Kiryu, 376-8515, Japan
the number of the condensers to make lower the temperature of the
plasma and generation of the soft X-ray was suppressed. We performed the
with the grazing-incidence spectroscope to analyze the wavelengths of the
From the spectral lines, generation of the EUV light of 13.5 nm was verified.
our small plasma focus device to the gas-puff style to increase the EUV
the gas-puff style, the peak value at the first peak became about twice higher
in the mixed gas style.
plasma focus, EUV, gas-puff operation